Exhibitor Seminars
ETSW13
Interpreter
TechSPOT WEST, East Hall 1, TOKYO BIG SIGHT
11:20-12:10 Fri., 14-Dec
Introduction of a new thickness measurement for in-situ and in-line in the manufacturing process
Sponsored by
Session Description
Since the thickness of each structure has a significant effect on the performance of semiconductor devices, it is necessary to measure the thickness of the film during and after each process. Our film thickness gauge features non-destructive, contactless, high-speed, high-precision, etc.
Program Agenda
OTSUKA ELECTRONICS CO.,LTD.