Exhibitor Seminars
ETSE09
Interpreter
TechSPOT Exhibitor Seminars, East Hall 4, TOKYO BIG SIGHT
12:40-13:30 Thu., 13-Dec
Challenges and solutions of CD-SEM based Edge Placement Error (EPE) metrologies
Sponsored by
Session Description
In this presentation, we introduce cutting edge SEM based metrologies as the robust solutions corresponding to challenging Edge Placement Error (EPE) control of EUV lithography and diversified patterning technologies beyond 7nm node devices for both research field and high volume manufacturing.
Program Agenda
Hitachi High-Technologies Corporation